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HMF-MBE200 High Magnetic Field MBE System
Product Overview
- Applications: metals, magnetic films, semiconductor heterojunctions
- Sample size: Standard flag-shaped sample holder
- Background vacuum: < 5×10-10 mbar
- Growth source components: 3 CF40 (grow ferromagnetic materials under strong magnetic field), 2 CF40 (grow conventional metals), 1 CF40 (radio frequency plasma source)
- Magnetic field strength: ± 9 T, uniformity < 0.1%
- Working temperature: room temperature – 1200 K