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Plasma Technology

The RF focused plasma excitation technology developed by the company breaks through the limitations of traditional plasma excitation such as high-voltage electrode discharge and high-power microwave source, making the application of low-temperature plasma technology in more fields become a reality. The high brightness and deep ultraviolet light source based on this technology is the key component of high performance photoelectron spectrometer, organic mass spectrometer, deep ultraviolet lithography and other high-end systems.

High Purity Gas Flow Control Panel

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Multi-Gas UlItra-High Flux VUV Source

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Focused VUV Source(BL1010S)

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Multi-Gas and monochromatic VUV Source(BL1100S)

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Multi-Gas and monochromatic VUV Source(BL1200S)

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high efficiency RF plasma crack

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