Ideal for III-V, II-VI material applications, the MBE-600 system can perform epitaxy on 1, 2, and 3-inch substrates, and its vertical chamber design and various advanced components enable precise layer-by-layer epitaxy.

The outstanding features of the MBE-600 are the system’s high reliability, versatility and compactness. These features make the MBE-600 system particularly suitable for R&D applications and near-series production. The standard version of the MBE-600 includes 10 source ports, 7 with flange size 4.5 inches (DN63CF) and 3 with flange size 2.75 inches (DN35CF). Customized versions of the MBE-600 also cover specific production needs, such as ultra-high vacuum cleavage coating systems.

Based on our customer’s requirements, we offer aa variety of evaporation sources, valved cracker sources, gas sources and electron beam evaporation sources. Using BFM, QCM, RHEED, RGA, etc., in situ characterization of the system can be obtained.  Fermion’s MBE software includes three major functions: growth process programming, automatic growth control, and uninterrupted data recording. The growth process program can be executed to control baffle movement, source furnace temperature, substrate temperature, substrate rotation speed and direction. Guaranteed maximum operational repeatability and safety. The control software includes temperature curve, vacuum pressure curve, power output power curve, control sample transfer between modules and other process functionalities.